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BiBTeX citation export for THVIR02: In-Situ Amorphous Carbon Coating of the Beam Screens of LHC’s Standalone Magnets

@unpublished{costapinto:ipac2020-thvir02,
  author       = {P. Costa Pinto and V. Baglin and P. Chiggiato and A.R. Costa and P. Cruikshank and P. Demolon and S. Fiotakis and M. Himmerlich and H. Kos and N. Kos and G. Marinaro and M. Taborelli and J. Tagg and D.A. Zanin},
% author       = {P. Costa Pinto and V. Baglin and P. Chiggiato and A.R. Costa and P. Cruikshank and P. Demolon and others},
% author       = {P. Costa Pinto and others},
  title        = {{In-Situ Amorphous Carbon Coating of the Beam Screens of LHC’s Standalone Magnets}},
  booktitle    = {Proc. IPAC'20},
  language     = {english},
  intype       = {presented at the},
  series       = {International Particle Accelerator Conference},
  number       = {11},
  venue        = {Caen, France},
  publisher    = {JACoW Publishing, Geneva, Switzerland},
  month        = {oct},
  year         = {2020},
  note         = {presented at IPAC2020 in Caen, France, unpublished},
  abstract     = {The heat load generated by the Electron Cloud (EC) in some superconducting magnets of the LHC has been recognized as a limiting factor for the operation of the High Luminosity LHC (HL-LHC). To overcome this problem, CERN launched a program to develop an "in-situ" coating technology to deploy amorphous carbon thin films - with a secondary electron yield below 1.1 - in the inner walls of the beam screens of selected magnets in the LHC tunnel. This includes the inner triplets for the two experiments in points 2 and 8, (ALICE and LHC-b), and some standalone magnets of their respective matching sections. In this work, we report on the first "in-situ" coating campaign that is being performed in Long Shutdown 2 (LS2, 2019-2020). The milestones of the R&D program are presented, namely achieving low secondary electron emission (by carbon and co-deposition of titanium); ensuring adhesion to the substrate (ion etching and titanium under layer); and implementing the mechanical setup to displace the sputtering source along 20 meters of beam screen in ultrahigh vacuum. The procedure is described as well as the main difficulties and achievements during the implementation in the tunnel.},
}